Intel, TSMC and Samsung's three major semiconductor factories will mass-produce 10nm process this year, among them progress is fast and even ready to launch 7nm process next year, will have to launch 5nm process around 2020. However, with the process technology upgrade, the semiconductor process is also approaching the limit, and manufacturing more and more difficult, 5nm after the process so far there is no clear conclusion, the transistor materials, processes need to be updated. At this point, the United States is at the forefront again. The researchers at Brookhaven National Laboratory in the United States announced the 1nm process manufacturing.
It has been reported that scientists at Brookhaven National Laboratory, a unit of the U.S. Department of Energy (DOE), have announced the creation of a new world record. They succeeded in manufacturing printing equipment with a size of only 1 nm, using electron beam printing instead of traditional Lithography printing technology.
Researchers at the lab creatively used electron microscopy to create smaller dimensions than conventional EBL (electron beam printing) processes. Electron-sensitive materials were greatly reduced in size by focused electron beams to The point where you can manipulate a single atom. The tool they make can dramatically change the material's properties, change from conductive to light, and interact in both states.
Their accomplishments were done at the Department of Energy's Functional Nanomaterials Center, which uses STEM (Scanning Projection Electron Microscopy) at 1 nm and is spaced at 11 nm so that 1 trillion characters per square millimeter can be achieved The density of features. Through the deviation correction STEM 2nm resolution was achieved at a half-grid of 5nm under the oxyhydroxide resist.
PS: These technologies sound exciting, but the technology developed by the lab does not represent a quick commercialization. The 1nm process at Brück & Hacker Lab has many differences from the current photolithography process, such as using an electron beam instead of Laser lithography, the material used is not silicon-based semiconductor but PMMA (polymethyl methacrylate) like, the next step they intend on silicon-based materials to try.
In fact, this is not the first time a scientist has realized the 1nm process. Last year, another national laboratory affiliated with the US Department of Energy - Lawrence Berkeley National Laboratory also announced the 1nm process using carbon nanotubes and molybdenum disulfide And other new materials. Similarly, this technology will not be put into mass production soon, because the carbon nanotube transistor with the PMMA, electron beam lithography as the current semiconductor technology with significant differences, to allow manufacturers to immediately eliminate all existing equipment This is simply impossible.
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